Equipment

MRC’s 12,000 sq. ft. cleanroom supports advanced micro- and nanofabrication across silicon, III–V, and soft materials. Core capabilities include sub-20 nm electron-beam lithography, alongside deposition, etching, thermal processing, and comprehensive characterization tools.

MRC equipment is located in the North Cleanroom of the Microelectronics and Engineering Research Center (MER) on the J.J. Pickle Research Campus.

Please visit the Access page to learn how to become a user and gain access to MRC facilities, including project proposal and onboarding, required training, and equipment reservations.

 

Asher (Microwave) 300 PVA Tepla

Asher (Microwave) 300 PVA Tepla

Location: MER 1.72
Photolithography
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HMDS Oven

HMDS Oven

Location: MER 1.720
Photolithography
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MLA150 MASKLESS ALIGNER SYSTEM

MLA150 - Maskless Aligner System

Location: MER 1.728
Photolithography
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EVG Mask Aligner

Photolithography i-g Line Mask Aligner - EVG

Location: MER 1.728
Photolithography
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MJB4 Mask Aligner

Photolithography i-g Line Mask Aligner - MJB4 Suss Microtec

Location: MER 1.728
Photolithography
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Suss MA8 Mask Aligner

Photolithography - Suss MA8/BA8

Location: MER 1.72
Photolithography
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Wafer Press

Wafer Press

Location: MER 1.728
Photolithography
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