Equipment

MRC’s 12,000 sq. ft. cleanroom supports advanced micro- and nanofabrication across silicon, III–V, and soft materials. Core capabilities include sub-20 nm electron-beam lithography, alongside deposition, etching, thermal processing, and comprehensive characterization tools.

MRC equipment is located in the North Cleanroom of the Microelectronics and Engineering Research Center (MER) on the J.J. Pickle Research Campus.

Please visit the Access page to learn how to become a user and gain access to MRC facilities, including project proposal and onboarding, required training, and equipment reservations.

 

E-beam writer JEOL 8100

E-beam Writer - JEOL 8100

Location: MER 1.720A
Electron Beam Lithography
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E-line Raith - Electron beam lithography

E-line Raith - Ebeam Lithography

Location: MER 1.730A
Electron Beam Lithography
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Raith 150 tow

Raith 150 Two - Ebeam Lithography

Location: MER 1.720A
Electron Beam Lithography
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